Objectives as a microlithography projection objective with at least one liquid lens

ABSTRACT

The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index n L  and at least one liquid lens (F) made from a transparent liquid, with a refractive index n F . At the operating wavelength the first lens has the greatest refractive index n L  of all solid lenses of the objective, the refractive index n F  of the at least one liquid lens (F) is bigger than the refractive index n L  of the first lens and the value of the numerical aperture NA is bigger than 1.

BACKGROUND OF THE INVENTION

1. Field of the Invention

This application is a continuation and claims the benefit of priority under 35 U.S.C. § 120 of U.S. application Ser. No. 10/562,257, filed Dec. 21, 2005, which is a National Phase application filed under 35 U.S.C. § 371, from PCT Application No. PCT/EP2004/014219, filed Dec. 14, 2004, which claims the benefit of priority to: U.S. Ser. No. 60/530,623, filed Dec. 19, 2003; U.S. Ser. No. 60/544,967 filed Feb. 13, 2004; U.S. Ser. No. 60/568,006 filed May 4, 2004; U.S. Ser. No. 60/591,775 filed Jul. 27, 2004; U.S. Ser. No. 60/592,208 filed Jul. 29, 2004; and U.S. Ser. No. 60/612,823 filed Sep. 24, 2004. These applications are incorporated herein by reference in their entirety.

The invention relates to an objective designed as a microlithography projection objective. The objective according to the invention comprises at least one liquid lens made from a transparent liquid.

2. Description of the Related Art

Microlithography projection objectives of multivarious design are known.

In all imaging systems, the smallest resolvable structural width is proportional to the numerical aperture NA at the image plane.

This, in turn, is proportional to the angle of incidence and the refractive index n_(I) of the medium through which the light falls onto the image plane.

By contrast with so-called dry objectives with gas (air, N₂, He and the like) or a vacuum with a refractive index of approximately 1.0, a material, in particular a liquid, with a substantially higher refractive index is used as this medium in immersion systems.

For example, as far as is known for the wavelength 193 nm water has a refractive index n_(H2O)=1.44.

High-index lenses with a refractive index much higher than 1.6 have been used in microlithography at wavelengths of greater than 365 nm, but they become incapable of use at the wavelengths of practical relevance such as 248 nm, 195 nm, 157 nm, since they are not sufficiently transparent, and so on. Lenses made from sapphire have a high refractive index but are birefringent, and this must be compensated in a complicated way and with limited success.

SUMMARY OF THE INVENTION

The inventors have recognized that, furthermore, the possible image-side numerical aperture NA is limited by the refractive index of the curved optical element next to the image plane.

Such an element can be provided as a liquid lens that can also serve simultaneously as immersion liquid, specifically with or without a plane-parallel separation plate. However, if the refractive index n_(F) thereof lags behind the refractive index n_(L) of the solid lenses used in the objective, the achievable NA remains still smaller, NA<n_(F).

The difference is significant in the case of a 193 nm objective with lenses made from fused silica with n_(L)=1.56 and with water as an immersion and a liquid lens with n_(F)=1.44.

According to the invention, use is made in the objective of at least one liquid lens whose refractive index n_(F) is greater than the refractive index n_(L) of each solid lens in the objective. The first lens in the meaning of claim 1 is the lens, arranged at any desired location in the objective, made from the highest-index solid lens material which is used in the objective. As also in the embodiments shown, all the lenses—except for the liquid lens or lenses—consist in many cases of the same solid material.

With respect to lenses made from fused silica or calcium fluoride, which are established for microlithography projection objectives with the operating wavelengths of 248 nm, 193 nm, 157 nm, liquids with, for example, n_(F)=1.6, n_(F)=1.65 or n_(F)=1.8 are suitable.

There is a corresponding result for other lens materials known for the deep UV (DUV) and vacuum UV, such as fluoride crystals BaF₂, SrF₂, LiF, NaF and others.

Although there are many developments of immersion liquids for applications in microlithography, it is clear at least in principle that H₂SO₄ (sulfuric acid), H₃PO₄ (phosphoric acid) and their solutions in H₂O (water) yield adjustable refractive indices of 1.5-1.8 at 193 nm in conjunction with suitable transmission. In addition, the corrosive action of these substances is substantially reduced with the aid of substitution of heavy isotopes, in particular deuterium. This is described inter alia in U.S. Application Ser. No. 60/568,006.

Corrosion protection layers can be provided on the solid optical elements. This is disclosed inter alia in U.S. Application Ser. No. 60/530,623.

Accordingly, an objective having the features of claim 1 has surprisingly been found to be particularly advantageous. A microlithography projection objective with an image-side numerical aperture NA greater than 1, which is not accessible for a dry objective, is substantially relieved and extended as regards the possibilities for its optical design and correction when use is made of a liquid lens with a refractive index greater than the refractive index of the solid lenses. In the case of lenses made from different materials, the largest refractive index of all these lenses is exceeded. A plane-parallel plate, in particular an end plate made from sapphire, for example, may have a higher refractive index, in this case.

Objectives are usually corrected for specific operating wavelengths and can be operated reasonably only at these wavelengths. The refractive indices of all materials vary with wavelength, and it is always the values for the operating wavelength which are used as a basis here. Other wavelengths can traverse the objective, for example for the purposes of measurement.

It has surprisingly been found that on the basis of the invention it is possible to design objectives with an NA greater than the refractive index n_(L) of every solid lens. This is also reflected in claim 2.

The liquid lens can be an immersion at the same time, that is to say it can be in contact to the object to be exposed. Alternatively, it is possible for an optical element made from a solid transparent body, in particular an end plate, to be arranged there between.

The liquids of the liquid lens and of the immersion at the object can then be adapted to various conditions such as:

-   -   in the case of the immersion:         -   rapid movement for step-and-scan         -   contact with materials of the wafer such as resist         -   contact with air         -   cleaning requirements for wafer processing after exposure     -   in the case of the liquid lens:         -   contact with material of the adjacent solid lens             and be selected, accordingly.

Since the refractive indices n_(F) of the liquid lens and n_(I) of the immersion are lower bounds for the achievable NA, it is natural to prefer that n_(F)=n_(I).

The effect of increasing the accessible NA caused by the liquid lens with high refractive index n_(F) becomes greatest when said lens is the last curved element on the image side.

Substantially hemispherical last lenses have proved in this case to be advantageous, since then the angle of incidence of the light varies relatively slightly over the lens surface and remains close to the normal to the curved surface. The critical angle of total reflection is thus effectively avoided.

Intermediate images in the objective are a measure by which the lens diameters can be kept small. The availability and the price of lens material and of finish-machined lenses in a quality suitable for microlithography projection objectives are very substantially relieved at lower diameters.

It is therefore to be pointed out that, otherwise than in the US classification 359/642 defined for LENS, here it is precisely also optical systems with an intermediate image, even several thereof, that are designated as an objective. Designs of objectives suitable for the invention are inter alia disclosed in U.S. Application Ser. No. 60/544,967, U.S. Application Ser. No. 60/592,208 and U.S. Application Ser. No. 60/591,775.

The field flattening is a central problem with such an objective, being equivalent to a minimization of the Petzval sum.

Primarily for this purpose, but also for color correction (achromatization), a design as a catadioptric system comprising at least one curved mirror in addition to the lenses is advantageous. A combination of a negative lens and a concave mirror is particularly effective for color correction. Further possibilities for color correction are disclosed in U.S. Application Ser. No. 60/530,978. Catadioptric systems frequently have folding mirrors, thereby permitting the light beams running to a mirror to be separated from those returning therefrom. Such systems are also described and covered here.

However, all surfaces of the optical system are effective for correction when all mirrors are curved. This is possible, in particular, with an even number, especially 2, of curved mirrors. It is also possible in this case for the entire objective to be constructed along a common axis of symmetry in relation to which all the mirror and lens surfaces exhibit a rotationally symmetrical shape where light passes through. However, there is asymmetric edging in the region of the mirrors and, if appropriate, adjacent lenses. Adjustment and vibration resistance as well as installation space requirements of the objective profit from the common axis of symmetry.

It is favorable in this case if the objective comprises an image-side objective part arranged at the image-side end of the objective and an intermediate objective part preceding the image-side objective part with respect of the direction of the light moving from the object-side end to the image-side end of the objective. If not defined otherwise, this direction is the reference whenever a position of a component of the objective is defined. The intermediate objective part is containing mirrors and may be designed catoptrically as, for example, in FIG. 1-FIG. 3, or catadioptrically as in the other embodiments. The image-side objective part, which is purely refractive, is providing the extreme aperture and comprises the liquid lens.

It did surprisingly turn out that this image side objective part advantageously has its pupil in the region of the beam path which is convergent in relation to the image plane, or, as described in claim 11, that said pupil is located between the lens of the greatest diameter used and the image plane.

In this region, the strong positive refractive power which is required in order to produce the large angles of incidence at the image plane in accordance with the high NA is expediently distributed over a plurality of positive meniscus lenses which are concave on the image side. Both chromatic aberrations and contributions to the Petzval sum are thereby reduced.

The inventors have established that the solid lens preceding the liquid lens according to the invention and defining the object-side surface of the liquid lens should be a meniscus lens whose center thickness (THICKNESS in accordance with the tables) is smaller than the difference of the radii of curvature (RADIUS) of the two lens surfaces. Such a meniscus lens having negative refractive power in the paraxial region makes a transition in part to an action of positive refractive power in the outer region where beams strike more steeply, that is from further outside, than the normal to the surface.

It is advantageous when the objective comprises an object-side objective part being arranged at the object-side end of the objective and producing an intermediate image on the object side of the intermediate objective part.

This permits, inter alia, greater freedom in configuring the passage of the light bundles next to the mirrors, and yields an additional diaphragm location which can well be situated in an air space and is therefore well suited as a stop-down aperture diaphragm.

It is to be seen in the embodiments that it is advantageous to provide lenses of low refractive power with a strongly modulated aspheric shape preceding this diaphragm plane and to provide a strongly curved meniscus lens subsequent to this diaphragm plane, the meniscus lens being concave on the diaphragm side.

It is clear that such high-aperture projection objectives for microlithography of very high resolution require intensive use of aspherics, since essential parameters for image correction are thereby provided.

Deliberate use is also made in the exemplary embodiments of very strong aspherics and those whose deviation from the spherical shape does not exhibit a monotonic profile over the distance from the optical axis.

As already mentioned, such aspherics are particularly advantageous in the object-side objective part.

It emerges in addition that in the image-side objective part some positive lenses yield particularly suitable arrangements of strong aspherics. These positive lenses are situated in the region of the steeply rising light bundle diameter between the negative lenses arranged near the intermediate image and the belly of the light bundle at the lens with the maximum of the diameter of the light bundle passing through.

The embodiments presented are partly of an experimental nature. However, to the person skilled in the art who compares these with similar design solutions known to him and derives modifications therefrom they yield clear-cut teachings from which he is able to modify designs of objectives.

The various designs of the individual embodiments make this clear, and can, of course, also be combined with one another and with other known designs in the meaning of the invention.

The exemplary embodiments are explained in more detail with the aid of the drawings, in which

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 to 6 respectively show a meridian section of an embodiment of an objective according to the invention.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

In FIG. 1 to 6 marginal and principal rays are depicted for the object points nearest and furthest from the axis. Aspheric surfaces are marked twice with 3 lines at the contour.

The optical axis or the axis of symmetry of the curvatures of the surfaces is marked by dots and dashes.

In each case OB denotes the object plane. This corresponds to the surface (SURF) 0 in the tables. IM denotes the image plane and corresponds in each case to the surface of the highest number in the tables.

F respectively denotes the liquid lens according to the invention.

EP denotes an optional end plate.

IMI1 and IMI2 are the intermediate images.

AP denotes the position of the system aperture at which an adjustable diaphragm can be arranged and will also be referred to as diaphragm plane.

P denotes the pupil in an image-side objective part.

All embodiments shown are designed for the operating wavelength 193.4 nm (ArF Excimer Laser) and reduce by 1:4—without limiting the invention thereto.

Tables 1 a to 6 a respectively give the design data for the drawing of the same number. Tables 1 b to 6 b respectively specify the aspheric data of the aspheric lens and mirror surfaces, which are identified in the drawings by three primes. The illustration is made using the Optik-Design-Software CODE V™ from Optical Research Associates and corresponds to their conventions.

In each embodiment shown in FIG. 1 to 6 the objective comprise an object-side objective part, an image-side objective part and an intermediate objective part. The object-side objective part is situated at the object-side end of the objective. The image-side objective part is situated at the image-side end of the objective. The intermediate objective part is situated between the object-side objective part and the image-side objective part. In the embodiments the object-side objective part and the image side objective part are purely reflective. The intermediate objective part is catoptric or catadioptric.

In the embodiments of FIG. 1 to FIG. 3 the value of the numerical aperture NA=1.4. The liquid of the lens F and the immersion have the same refractive index n_(F)=n_(I)=1.65. The material of the solid lenses is fused silica with an index of refraction n_(L)=1.56.

The distance from the object plane OB to the image IM is 1250 mm and thereby a common value.

The image field is 26 mm×5.5 mm, decentered by 4.66 mm. However, the correction state yields an RMS wave front error of this image field of approximately 10-20 per mil of the operating wavelength.

The lenses of the object-side objective part and the image side objective part are rotationally symmetrical in relation to a common axis of symmetry, with the two mirrors of the catoptric version of the intermediate objective part certainly being curved in an axially symmetrical fashion, but being edged asymmetrically.

The design of the objective will now be described in more detail with respect to the embodiment of FIG. 1. Most of the features are also present at the embodiments of FIG. 2 to 6, but will only be explained in some detail with respect to FIG. 1.

The object-side objective part comprises an accessible diaphragm plane AP with the stop-down system diaphragm. Preceding the diaphragm plane AP there is a particularly strongly modulated aspheric (surface 7 of table 1a/b). Subsequent to the diaphragm plane AP there is a meniscus lens which is concave on the side of the diaphragm plane AP (surfaces 15, 16 in table 1a).

The intermediate objective part is designed catoptrically and comprises two concave mirrors (surfaces 23, 24 in table 1a).

The image-side objective part subsequent to the second intermediate image IMI2—the intermediate images are not corrected and do not form an image plane—begins with a positive lens group of single-lens design, forms a waist with a number of negative lenses, and has a positive lens group with many members which forms a massive belly.

Strongly modulated aspherics (inter alia, surface 36 in table 1a/b) are significant in the initial region of the positive lens group where the diameter of the light bundle and of the lenses are increasing. The middle of the belly is formed by the lens of greatest diameter (surface 41/42 in table 1a/b, height (SEMIDIAM, half lens diameter) 160 mm). The production of lithographic projection objectives is very economical with this lens diameter. The pupil P of the image-side objective part is, in a fashion typical of the objectives according to the invention, following this largest lens in the convergent beam path.

In the embodiment of FIG. 1, the liquid lens F is formed between the surface 50 and the image plane IM (surface 52) and is at the same time the immersion. It is virtually hemispherical given the radius 34.6 mm and the thickness 30.1+3.0=33.1 mm. The ratio of radius to thickness is 1.05. The adjacent last fused silica lens is in this case a meniscus lens whose thickness of 10 mm is substantially smaller than the difference of the radii 66 mm-34 mm (surfaces 49/50).

In the embodiment of FIG. 2, once again the liquid lens F is at the same time likewise immersion. However, it is substantially flatter than the liquid lens F of FIG. 1. Only in combination with the last fused silica lens, the liquid lens F forms an approximately hemispherical member.

Using a rather flat liquid lens F makes the exchange of the liquid simpler.

It has been established that a plane-parallel plate which separates the liquid lens F and the immersion is not critical for the optical function. This holds in particular when the refractive index of the plan-parallel plate is greater than the refractive indices n_(F) of the liquid lens F and n_(I) of the immersion.

Starting from the embodiment of FIG. 1, FIG. 3 shows an embodiment with such an end plate EP of refractive index n_(EP)=1.80. By adapting the thickness, it can easily be exchanged for a plate made from sapphire with n_(EP)=1.92.

In the embodiment of FIG. 4 (table 4a/b) a catadioptric design is used for the intermediate objective part.

Given the same NA, n_(F), n_(L) as the preceding embodiments, the image field is somewhat deviant with 22×5.2 mm and greater decentering of 5.753 mm.

In this embodiment two planar folding mirrors FM1 (surface 21) and FM2 (surface 31) are used as geometric beam splitters. Provided in a lateral arrangement are a concave mirror—surface 26 in table 4a/b—and lenses of negative refractive power through which the light passes twice. The surfaces 22-25 of these lenses are thus present once more specularly as 27 to 30 in table 4a/b, since they refract the light twice.

The high-index liquid lens F is also advantageously used with this quite different approach to the design of the microlithographic projection objective. In a way similar to FIG. 1, it is designed here as “immersion lens”, touching the object, between the surfaces 63 and 65.

The two embodiments of FIG. 5 and FIG. 6 for the first time exhibit objectives with the numerical aperture NA=1.6 being greater than the refractive index n_(L) of the solid lenses used. The solid lenses are made from fused silica with n_(L)=1.56. The refractive index of the liquid lens F is n_(F)=1.80. Also these embodiments are corrected much better than in a diffraction-limited fashion, their image field being 20 mm×4 mm at a decentering of 4.375 mm. The RMS wavefront error is below a tenth of the operating wavelength 193.4 mm.

Here, as well, the object-side objective part is purely refractive. It includes the accessible and stop-down diaphragm plane AP and strong aspherics preceding the diaphragm plane AP. Here these aspherics are two lenses of lesser refractive power but stronger modulation of the aspheric shape deviation, surfaces 5 and 8 in table 5a/b. Arranged subsequent to these aspherics is a likewise strongly curved meniscus lens, surfaces 10, 11 in table 5a/6.

The intermediate objective part is once again a prolate catadioptric objective with two concave mirrors, similar to FIG. 1-3, but now with a positive field lens (surfaces 20, 21 in table 5a) preceding the second intermediate image IMI2.

The positive field lens replaces the positive first lens group present in FIG. 1-3 in the image-side objective part.

The image-side objective part thus begins with a negative lens group and forms a belly with a multilens positive lens group. In the embodiment of FIG. 5 the greatest lens diameter is reached with 165 mm at the lenses 30/31 and 32/33 as can be seen in table 5a. A plurality of positive meniscus lenses which are concave in relation to the image plane IM is arranged subsequent to these lenses. The pupil P of the image-side objective part lies in the region of these meniscus lenses. The last fused silica lens (surfaces 40, 41 of table 5a) on the image side is once again of negative refractive power in the paraxial region. This lens is formed as a meniscus lens with a concave surface on the image side whose thickness is 8.9 mm and thus smaller than the difference of the radii 58.8 mm-37.8 mm=21 mm.

In the embodiment of FIG. 5, the liquid lens F is immersion at the same time, and thus abuts the image plane IM and the object, which is arranged there in order to exposed. This object can be, for example, a wafer. The radius of the spherical surface 41 is 37.8 mm and thus smaller than the thickness of 45.8 mm. The sine of the angle of incidence is smaller than 0.89 at all surfaces. The catadioptric intermediate objective part is enlarging. The sines of the angles of incidence at the concave mirrors are below 0.45.

The embodiment of FIG. 6 and table 6a/b comprise a 3.0 mm thick end plate EP made from sapphire. The liquid lens F is now formed between the surfaces 42, 43 of table 6a. Their thickness is 40.2 mm, the radius is 38.1 mm. The thickness is thus 105% of the radius.

It has thus been shown that liquid lenses F of high refractive index permit the design of high-quality projection objectives with extreme numerical apertures.

Multivarious approaches and instructions are thus given to the person skilled in the art in order to use this teaching for further developing different kinds of known approaches in designing objectives.

TABLE 1a SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM.  0 = OB ∞ 35.000000 1.00030168 66.000  1 ∞ 0.100881 1.00030168 77.003  2 173.279980 34.026411 SIO2V 1.56078570 90.000  3 −1081.359892 2.602590 1.00029966 90.000  4 284.316798 47.383982 SIO2V 1.56078570 95.000  5 −1674.306964 22.855576 1.00029966 95.000  6 577.261196 36.645573 SIO2V 1.56078570 76.354  7 −314.377359 0.999980 1.00029966 73.677  8 290.150309 25.000000 SIO2V 1.56078570 75.000  9 −348.828624 1.000000 1.00029966 75.000 10 357.767685 29.107951 SIO2V 1.56078570 75.000 11 −185.316330 18.309132 1.00029966 75.000 12 ∞ 0.000000 1.00029966 36.370 13 ∞ 10.000000 SIO2V 1.56078570 44.778 14 ∞ 24.909905 1.00029966 47.596 15 −65.374870 14.999947 SIO2V 1.56078570 50.000 16 −87.154980 13.643080 1.00029966 60.000 17 −175.112352 18.964687 SIO2V 1.56078570 65.000 18 −111.646867 1.049880 1.00029966 70.000 19 −155.839260 37.603622 SIO2V 1.56078570 80.000 20 −102.943508 0.099910 1.00029966 80.000 21 ∞ 40.000000 1.00029966 90.389 22 ∞ 209.622700 1.00029966 92.498 23 −166.402525 −209.622700 REFL 1.00029966 150.000 24 173.713446 209.622700 REFL 1.00029966 125.000 25 ∞ 40.000000 1.00029966 99.138 26 ∞ 0.100021 1.00029966 105.283 27 174.736655 46.035435 SIO2V 1.56078570 110.000 28 369.899337 2.484896 1.00029966 105.000 29 511.775400 10.000000 SIO2V 1.56078570 95.000 30 117.498299 37.368783 1.00029966 80.000 31 −690.607305 10.000000 SIO2V 1.56078570 80.000 32 153.845418 25.455370 1.00029966 80.000 33 20331.979093 10.000000 SIO2V 1.56078570 90.000 34 347.272006 22.437822 1.00029966 90.000 35 502.344250 44.143760 SIO2V 1.56078570 120.000 36 −231.373663 17.400867 1.00029966 120.000 37 −837.483770 31.483968 SIO2V 1.56078570 130.000 38 −254.746002 6.600316 1.00029966 135.000 39 −392.185232 82.775939 SIO2V 1.56078570 140.000 40 −196.513232 1.000000 1.00029966 155.000 41 610.397747 56.287416 SIO2V 1.56078570 160.000 42 −556.907407 0.999835 1.00029966 160.000 43 296.607308 48.957456 SIO2V 1.56078570 150.000 44 −1578.327293 1.000000 1.00029966 150.000 45 216.352446 43.826306 SIO2V 1.56078570 125.000 46 2322.892305 1.000000 1.00029966 125.000 47 101.534703 42.624105 SIO2V 1.56078570 88.000 48 255.691515 0.999893 1.00029966 85.000 49 66.827516 10.000000 SIO2V 1.56078570 52.000 50 34.581844 30.092080 (F) 1.65000000 34.000 51 ∞ 3.000000 (F) 1.65000000 34.000 52 = IM ∞ 34.000

TABLE 1b ASPHERIC ONSTANTS SRF 2 5 7 17 19 K 0 0 0 0 0 C1 −5.719118e−08 −1.218375e−07 4.192613e−07 −2.035191e−07 6.581837e−08 C2 −6.011473e−13  9.454546e−12 4.225479e−12 −2.746520e−11 1.290762e−11 C3 −2.863941e−16 −1.629731e−15 1.483284e−15 −2.529717e−15 6.638127e−16 C4  2.205921e−20  1.088963e−19 3.420546e−19  5.381454e−19 −2.943367e−19  C5 −5.981074e−24  8.373344e−24 −2.828899e−23  −1.447893e−22 3.550178e−24 C6  1.047361e−27 −1.832764e−27 −1.680731e−27  −3.175732e−27 6.050767e−28 C7 −1.013527e−31  1.046373e−31 2.906586e−31  5.176529e−30 4.358568e−31 C8  4.076124e−36 −1.708389e−36 −5.252329e−35  −1.024665e−33 −4.270946e−35  SRF 23 24 28 36 37 K −0.602272 −0.240254 0 0 0 C1  0.000000e+00 0.000000e+00 −1.628020e−07  2.060497e−08 −7.918942e−08 C2 −9.110764e−15 3.799619e−15 5.004648e−12 6.206171e−13 −7.390346e−13 C3 −6.923032e−20 1.050462e−19 1.238115e−16 1.568846e−16  1.677228e−16 C4 −1.592422e−23 2.407529e−23 1.345805e−20 −1.970417e−20  −6.727857e−21 C5  8.704660e−28 −2.336605e−27  −5.722714e−24  2.817612e−24  6.703292e−25 C6 −3.848813e−32 2.089863e−31 7.429779e−28 −2.065939e−28  −1.712552e−29 C7  8.257231e−37 −8.540536e−36  −5.390293e−32  7.979829e−33 −9.430098e−34 C8 −7.590177e−42 1.725784e−40 1.988577e−36 −1.039469e−37   4.239222e−38 SRF 39 43 46 K 0 0 0 C1  5.160606e−09 −2.788258e−08 −2.365786e−08 C2 −2.393183e−13  4.064341e−13  3.640299e−12 C3 −7.204528e−17  2.762083e−17 −1.570433e−16 C4 −1.517240e−22 −4.172618e−22  6.381899e−21 C5 −3.032479e−27 −3.754486e−27 −3.770869e−26 C6  1.227351e−29 −6.324033e−31 −1.116749e−29 C7 −8.867490e−34  3.185590e−35  6.455153e−34 C8  2.067251e−38 −4.120762e−40 −1.076920e−38

TABLE 2a SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM.  0 = OB ∞ 35.000000 1.00030168 66.000  1 ∞ 1.166644 1.00030168 77.003  2 197.911058 20.674095 SIO2V 1.56078570 90.000  3 635.116021 2.894278 1.00029966 90.000  4 154.515346 52.818599 SIO2V 1.56078570 95.000  5 −674.545898 46.213532 1.00029966 95.000  6 351.508267 12.006164 SIO2V 1.56078570 76.354  7 −355.431508 1.879459 1.00029966 73.677  8 137.853261 42.368303 SIO2V 1.56078570 75.000  9 −168.451126 1.576637 1.00029966 75.000 10 ∞ 18.000000 1.00029966 36.370 11 ∞ 10.000000 SIO2V 1.56078570 44.778 12 ∞ 25.245183 1.00029966 47.596 13 −69.535170 15.000107 SIO2V 1.56078570 50.000 14 −125.326320 1.000069 1.00029966 60.000 15 −178.873389 25.788410 SIO2V 1.56078570 65.000 16 −101.720844 15.664259 1.00029966 70.000 17 −199.223616 36.639577 SIO2V 1.56078570 80.000 18 −102.251112 0.099749 1.00029966 80.000 19 ∞ 40.000000 1.00029966 90.389 20 ∞ 209.622700 1.00029966 92.498 21 −166.119896 −209.622700 REFL 1.00029966 150.000 22 175.984040 209.622700 REFL 1.00029966 125.000 23 ∞ 40.000000 1.00029966 99.138 24 ∞ 0.172730 1.00029966 105.283 25 253.724164 38.159409 SIO2V 1.56078570 110.000 26 −576.959427 1.129890 1.00029966 110.000 27 969.471804 12.758546 SIO2V 1.56078570 105.000 28 349.602989 0.999948 1.00029966 105.000 29 528.180407 10.000000 SIO2V 1.56078570 95.000 30 121.034243 37.709281 1.00029966 80.000 31 −511.453381 10.000000 SIO2V 1.56078570 80.000 32 144.865830 27.748574 1.00029966 80.000 33 −2683.436282 10.000000 SIO2V 1.56078570 90.000 34 350.818886 21.231421 1.00029966 90.000 35 564.353180 43.838798 SIO2V 1.56078570 120.000 36 −231.828235 17.071926 1.00029966 120.000 37 −844.682254 27.174378 SIO2V 1.56078570 130.000 38 −257.084208 13.572085 1.00029966 135.000 39 −347.360290 79.971864 SIO2V 1.56078570 140.000 40 −191.420105 1.000000 1.00029966 155.000 41 638.593875 53.484057 SIO2V 1.56078570 160.000 42 −617.708478 0.999739 1.00029966 160.000 43 290.550562 51.321670 SIO2V 1.56078570 150.000 44 −1239.997337 1.000000 1.00029966 150.000 45 234.055441 41.191419 SIO2V 1.56078570 125.000 46 1260.796700 1.000000 1.00029966 125.000 47 119.116897 46.087832 SIO2V 1.56078570 92.000 48 410.714306 0.999596 1.00029966 90.000 49 57.007308 19.999880 SIO2V 1.56078570 52.000 50 70.000000 24.719485 (F) 1.65000000 48.000 51 ∞ 3.000000 (F) 1.65000000 34.000 52 = IM ∞ 34.000

TABLE 2b ASPHERIC CONSTANTS SRF 2 5 7 15 17 K 0 0 0 0 0 C1 −4.272071e−08 −6.660852e−08 4.612425e−07 −1.819217e−07 −2.134272e−08 C2 −2.130756e−12  5.070507e−12 1.287676e−11 −1.679339e−11  2.642130e−12 C3 −3.407494e−16 −7.615346e−16 2.169742e−15 −4.541462e−15  3.144530e−16 C4  4.132704e−20  7.606615e−20 3.202709e−19  1.365731e−18 −1.203833e−19 C5 −8.614408e−24  5.842474e−24 1.189789e−22 −7.298537e−22  3.777303e−23 C6  1.402057e−27 −1.689387e−27 −4.328782e−26   1.116111e−25 −6.878338e−27 C7 −1.320281e−31  1.280496e−31 5.025746e−30  4.239480e−31  6.547727e−31 C8  6.029685e−36 −3.499149e−36 −2.455352e−34  −2.801453e−33 −2.572158e−35 SRF 21 22 28 36 37 K −0.673243 −0.223377 0 0 0 C1  0.000000e+00 0.000000e+00 −1.742865e−07  −1.146354e−09 −8.904146e−08 C2 −1.542990e−14 4.242474e−15 3.989651e−12  6.487508e−13 −9.704035e−13 C3 −2.283008e−19 −1.633115e−19  2.232371e−16  2.106572e−16  1.932349e−16 C4 −2.701974e−23 7.966751e−23 −2.851297e−20  −1.981895e−20 −9.140962e−21 C5  1.563798e−27 −8.898817e−27  1.148424e−24  2.432642e−24  7.612481e−25 C6 −7.092827e−32 6.276885e−31 3.102982e−28 −1.327579e−28 −5.817189e−30 C7  1.654890e−36 −2.262895e−35  −5.058499e−32   4.126250e−33 −1.250231e−33 C8 −1.695530e−41 3.532661e−40 3.007511e−36 −3.753435e−38  3.610689e−38 SRF 39 43 46 K 0 0 0 C1 6.669745e−09 −3.063876e−08 −3.402805e−08 C2 1.190421e−13  3.642882e−13  4.126635e−12 C3 −7.888065e−17   2.784805e−17 −1.931151e−16 C4 −5.882168e−23  −6.429270e−22  8.149530e−21 C5 2.413262e−26  8.661549e−27 −7.144438e−26 C6 8.242901e−30 −8.015685e−31 −1.341671e−29 C7 −6.256631e−34   2.825051e−35  7.855498e−34 C8 1.445073e−38 −3.170258e−40 −1.361588e−38

TABLE 3a SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM.  0 = OB ∞ 35.000000 1.00030168 66.000  1 ∞ 0.099980 1.00030168 77.003  2 170.078547 36.468596 SIO2V 1.56078570 90.000  3 −599.314872 2.182511 1.00029966 90.000  4 333.623154 49.026243 SIO2V 1.56078570 95.000  5 −5357.879827 17.783452 1.00029966 95.000  6 524.085081 39.656864 SIO2V 1.56078570 76.354  7 −372.985082 1.020916 1.00029966 73.677  8 273.494931 25.000000 SIO2V 1.56078570 75.000  9 −304.985535 1.000000 1.00029966 75.000 10 326.223899 32.555959 SIO2V 1.56078570 75.000 11 −194.836449 18.000006 1.00029966 75.000 12 ∞ 0.000000 1.00029966 36.370 13 ∞ 10.000000 SIO2V 1.56078570 44.778 14 ∞ 24.420303 1.00029966 47.596 15 −65.482398 15.000019 SIO2V 1.56078570 50.000 16 −89.830925 12.487606 1.00029966 60.000 17 −181.375682 17.778805 SIO2V 1.56078570 65.000 18 −112.069227 1.008243 1.00029966 70.000 19 −158.283947 37.090377 SIO2V 1.56078570 80.000 20 −102.436390 0.099969 1.00029966 80.000 21 ∞ 40.000000 1.00029966 90.389 22 ∞ 209.622700 1.00029966 92.498 23 −166.136319 −209.622700 REFL 1.00029966 150.000 24 173.615104 209.622700 REFL 1.00029966 125.000 25 ∞ 40.000000 1.00029966 99.138 26 ∞ 0.104935 1.00029966 105.283 27 161.705740 39.665166 SIO2V 1.56078570 110.000 28 338.219127 4.220151 1.00029966 105.000 29 539.284856 10.000000 SIO2V 1.56078570 95.000 30 115.279475 38.192763 1.00029966 80.000 31 −713.073292 10.000000 SIO2V 1.56078570 80.000 32 153.450259 25.766812 1.00029966 80.000 33 −35457.805610 10.000000 SIO2V 1.56078570 90.000 34 338.447211 22.577058 1.00029966 90.000 35 488.793543 45.370961 SIO2V 1.56078570 120.000 36 −229.090765 17.224093 1.00029966 120.000 37 −813.380443 31.337371 SIO2V 1.56078570 130.000 38 −255.856356 9.074786 1.00029966 135.000 39 −397.181958 81.335823 SIO2V 1.56078570 140.000 40 −197.104943 1.000000 1.00029966 155.000 41 616.283620 55.915659 SIO2V 1.56078570 160.000 42 −558.051853 0.999900 1.00029966 160.000 43 297.754439 48.959126 SIO2V 1.56078570 150.000 44 −1599.554010 1.000000 1.00029966 150.000 45 216.813876 43.986900 SIO2V 1.56078570 125.000 46 2513.355923 1.000000 1.00029966 125.000 47 102.047705 42.326072 SIO2V 1.56078570 88.000 48 258.213934 1.000000 1.00029966 85.000 49 67.045666 10.000000 SIO2V 1.56078570 52.000 50 33.992537 27.639900 (F) 1.65000000 33.000 51 ∞ 3.000000 1.80000000 33.000 52 ∞ 3.000000 (IMMERS.) 1.65000000 33.000 53 = IM ∞ 33.000

TABLE 3b ASPHERIC CONSTANTS SRF 2 5 7 17 19 K 0 0 0 0 0 C1 −6.761238e−08 −1.339952e−07 4.322957e−07 −1.865717e−07 5.694739e−08 C2 −2.795074e−13  8.081896e−12 6.638487e−12 −2.605817e−11 1.297663e−11 C3 −3.419978e−16 −1.520519e−15 1.196137e−15 −2.223425e−15 7.551094e−16 C4  3.593975e−20  1.158356e−19 3.139076e−19  4.529397e−19 −2.801640e−19  C5 −7.394770e−24  8.165985e−24 −2.103438e−23  −1.036163e−22 −1.293839e−24  C6  1.067458e−27 −2.018394e−27 −2.540248e−27  −6.085859e−27 7.867948e−28 C7 −9.043542e−32  1.252003e−31 3.764879e−31  4.354732e−30 4.763906e−31 C8  3.329797e−36 −2.409824e−36 −5.551249e−35  −7.881442e−34 −4.577122e−35  SRF 23 24 28 36 37 K −0.603427 −0.236665 0 0 0 C1  0.000000e+00 0.000000e+00 −1.724255e−07  1.725752e−08 −8.279489e−08 C2 −1.058224e−14 3.699741e−15 4.976445e−12 5.471441e−13 −8.022210e−13 C3 −1.413269e−19 −3.750775e−20  2.387092e−16 1.390990e−16  1.431148e−16 C4 −1.204112e−23 5.430640e−23 5.525729e−21 −1.755950e−20  −5.767930e−21 C5  4.963866e−28 −5.801174e−27  −6.052665e−24  2.625696e−24  6.871766e−25 C6 −2.129066e−32 4.279164e−31 7.725095e−28 −1.914617e−28  −2.240962e−29 C7  3.795477e−37 −1.574698e−35  −5.045738e−32  7.395971e−33 −3.639715e−34 C8 −2.918284e−42 2.685481e−40 1.564423e−36 −7.980691e−38   3.135529e−38 SRF 39 43 46 K 0 0 0 C1  5.939680e−09 −2.752287e−08 −2.413171e−08 C2 −2.375134e−13  4.114456e−13  3.695674e−12 C3 −6.806224e−17  2.737675e−17 −1.621470e−16 C4 −8.082613e−23 −3.526372e−22  6.681382e−21 C5 −1.967221e−26 −7.704679e−27 −4.618168e−26 C6  1.266402e−29 −4.719101e−31 −1.117841e−29 C7 −8.622711e−34  2.794633e−35  6.554350e−34 C8  1.902299e−38 −3.716332e−40 −1.099816e−38

TABLE 4a SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM.  0 = OB ∞ 101.496840 62.000  1 −523.184936 27.851984 SIO2 1.56032610 96.419  2 −210.066935 0.999968 99.916  3 143.399781 52.055602 SIO2 1.56032610 115.102  4 345.776862 35.383042 110.966  5 168.075295 52.902563 SIO2 1.56032610 95.593  6 −581.011371 0.099991 85.017  7 82.494445 46.014670 SIO2 1.56032610 65.623  8 74.608756 18.376623 43.366  9 ∞ 0.000000 SIO2 1.56032610 40.333 10 ∞ 9.898700 40.333 11 −93.661632 25.608969 SIO2 1.56032610 40.388 12 −97.944812 42.548618 50.610 13 −63.503040 54.172316 SIO2 1.56032610 58.454 14 −94.409957 1.264244 87.595 15 −328.877474 40.537580 SIO2 1.56032610 104.907 16 −131.896136 1.001643 106.846 17 204.370502 42.653441 SIO2 1.56032610 107.596 18 −2747.675446 1.723900 105.816 19 216.208053 27.952948 SIO2 1.56032610 97.813 20 2712.784924 99.872557 94.335 21 = FM1 ∞ −160.545313 REFL 27.154 22 101.244286 −12.500000 SIO2 1.56032610 72.986 23 628.850173 −53.212241 88.277 24 102.805812 −12.500000 SIO2 1.56032610 91.193 25 200.305727 −25.464217 119.887 26 150.933505 25.464217 REFL 122.686 27 200.305727 12.500000 SIO2 1.56032610 119.499 28 102.805812 53.212241 90.105 29 628.850173 12.500000 SIO2 1.56032610 85.671 30 101.244286 160.545353 71.821 31 = FM2 ∞ −109.999623 REFL 134.552 32 862.422907 −30.130833 SIO2 1.56032610 102.165 33 229.773890 −0.999915 105.942 34 −617.789022 −35.509195 SIO2 1.56032610 118.697 35 565.469461 −0.999931 120.255 36 −246.806971 −44.859593 SIO2 1.56032610 124.965 37 32400.831779 −0.099930 123.417 38 −158.610832 −71.070427 SIO2 1.56032610 112.458 39 −1341.469728 −8.796304 98.473 40 3541.685396 −11.999956 SIO2 1.56032610 96.987 41 −126.167849 −44.791303 78.038 42 469.858200 −11.999957 SIO2 1.56032610 78.204 43 −108.758112 −27.637030 84.487 44 −1480.509587 −15.438600 SIO2 1.56032610 86.624 45 2433.499100 −49.439954 90.710 46 −1932.185692 −25.660740 SIO2 1.56032610 119.141 47 428.080551 −0.999961 123.769 48 −408.475637 −36.662820 SIO2 1.56032610 147.587 49 −16389.465356 −7.335981 148.838 50 −342.428932 −60.116835 SIO2 1.56032610 158.305 51 658.847066 −0.091541 157.731 52 ∞ 0.000000 SIO2 1.56032610 156.315 53 ∞ −2.670708 156.315 54 −702.444090 −32.792626 SIO2 1.56032610 155.963 55 1222.808780 −0.999915 155.470 56 −309.712976 −41.860232 SIO2 1.56032610 144.999 57 3694.385507 −0.999819 144.012 58 −135.513673 −31.965622 SIO2 1.56032610 109.063 59 −185.513505 −0.999775 103.967 60 −88.090936 −38.540831 SIO2 1.56032610 80.707 61 −187.712668 −0.999577 73.736 62 −58.692832 −9.999803 SIO2 1.56032610 51.770 63 −33.167937 −38.114503 (F) 1.65000000 33.117 64 ∞ −3.000000 (F) 1.65000000 20.048 65 = IM ∞ 15.841

TABLE 4b ASPHERIC CONSTANTS SRF 6 15 20 22 30 39 41 K 0 0 0 0 0 0 0 C1 1.190289e−07 −1.976769e−08 4.403358e−08 −6.572731e−08 −6.572731e−08 1.699431e−08 −2.143897e−07 C2 −2.160947e−12   1.109889e−12 8.071972e−17 −4.743844e−12 −4.743844e−12 −9.046901e−12   2.732198e−12 C3 6.852608e−16 −3.889116e−17 3.366541e−18 −9.012440e−18 −9.012440e−18 1.128480e−15 −1.371285e−15 C4 −3.837379e−20  −1.882901e−21 5.100729e−22 −1.597994e−19 −1.597994e−19 −9.595855e−20  −1.137997e−19 C5 1.217764e−25  1.332477e−25 −4.259657e−26   2.141145e−23  2.141145e−23 5.011204e−24  2.693954e−23 C6 2.211313e−28 −2.258521e−30 2.686157e−30 −2.250289e−27 −2.250289e−27 −1.196219e−28  −3.312568e−27 SRF 43 46 51 59 61 K 0 0 0 0 0 C1 2.168103e−07 3.156834e−08 −7.013045e−09  4.429013e−08 −9.119846e−08 C2 1.367067e−12 3.487654e−13 5.963914e−16 −4.664097e−12  −9.933832e−12 C3 3.062347e−16 −1.560492e−17  −1.630073e−17  3.978191e−16  4.577490e−16 C4 5.350290e−20 1.140928e−21 5.396066e−22 −1.307434e−20  −2.618132e−19 C5 −4.811379e−24  −4.815997e−26  −7.602819e−27  −5.651715e−25   5.019446e−23 C6 4.970104e−28 5.836063e−31 4.085943e−32 3.529575e−29 −5.414482e−27

TABLE 5a SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM.  0 = OB ∞ 31.284792 52.000  1 194.413567 32.720399 SIO2V 1.56078570 74.615  2 −837.875926 6.370734 74.349  3 95.475130 26.728836 SIO2V 1.56078570 70.388  4 148.726918 30.489652 65.856  5 1084.901978 14.117445 SIO2V 1.56078570 60.419  6 −329.264238 0.743287 58.910  7 372.368293 15.458004 SIO2V 1.56078570 54.832  8 −148.979042 27.240305 52.113  9 ∞ 32.301644 43.951 10 −57.723183 31.449460 SIO2V 1.56078570 47.695 11 −71.150453 0.929754 62.740 12 383.639393 22.046149 SIO2V 1.56078570 83.185 13 −904.695268 0.905975 84.675 14 179.698033 38.448563 SIO2V 1.56078570 90.818 15 −389.247961 29.862111 90.050 16 ∞ 258.234067 85.109 17 −151.387947 −258.234067 REFL 103.744 18 258.267631 258.234067 REFL 180.342 19 ∞ 29.981280 116.992 20 251.052546 31.241091 SIO2V 1.56078570 101.576 21 −6016.827917 77.406555 98.554 22 −125.618112 8.960662 SIO2V 1.56078570 70.289 23 129.125754 28.406854 68.882 24 −681.780853 8.898731 SIO2V 1.56078570 70.634 25 205.568565 41.577461 78.503 26 −183.215344 15.843375 SIO2V 1.56078570 82.563 27 −747.008350 6.201177 102.654 28 1186.195936 72.658205 SIO2V 1.56078570 120.160 29 −156.971444 0.905847 126.492 30 648.451941 66.013805 SIO2V 1.56078570 163.810 31 −396.824326 25.988117 165.175 32 289.870283 40.412480 SIO2V 1.56078570 163.677 33 480.887470 0.928925 161.538 34 178.362272 40.967739 SIO2V 1.56078570 144.125 35 253.519298 0.947294 138.643 36 154.855021 52.211656 SIO2V 1.56078570 125.560 37 522.613285 0.825571 119.129 38 100.582695 44.936735 SIO2V 1.56078570 88.620 39 272.608820 0.825571 79.210 40 58.829925 8.861393 SIO2V 1.56078570 52.876 41 37.856352 45.769132 (F) 1.80000000 37.564 42 = IM ∞ 13.001

TABLE 5b ASPHERIC CONSTANTS SRF 1 5 8 15 17 18 K 0 0 0 0 0 −0.267731 C1 2.035368e−07 1.161173e−07 6.549025e−07 1.058964e−07 1.486128e−08 −7.023674e−10 C2 2.122045e−13 −9.174854e−11  1.133907e−11 −1.960464e−12  6.224903e−13 −9.477643e−15 C3 −1.232124e−15  9.078126e−15 2.931708e−14 −1.719346e−16  1.675590e−17 −7.423466e−20 C4 6.485869e−20 −1.260952e−18  −8.285156e−18  2.217335e−20 1.269177e−21 −4.429195e−24 C5 9.917577e−24 2.019305e−22 3.500031e−21 −1.159319e−24  −5.260128e−26   4.705745e−29 C6 −9.582163e−28  −7.811919e−27  3.522430e−26 2.527662e−29 4.654328e−30 −1.008977e−33 SRF 22 25 28 33 37 39 K 0 0 0 0 0 0 C1 4.605486e−07 2.881794e−07 −3.576109e−08 −1.085274e−08 2.842058e−08 1.106769e−07 C2 −7.227058e−11  −4.494181e−11   8.140963e−13  1.115172e−13 −9.189727e−15  2.940296e−12 C3 1.056869e−14 −2.448411e−15  −3.935804e−17 −9.843842e−18 7.067187e−17 −8.536341e−17  C4 −1.243813e−18  9.621332e−19 −7.624420e−22 −1.420093e−22 −5.862923e−21  4.590349e−20 C5 1.098424e−22 −9.474976e−23   1.473104e−25  1.350399e−26 2.902121e−25 −8.754730e−24  C6 −3.554283e−27  3.735014e−27 −5.284140e−30 −1.682167e−31 −4.976330e−30  5.665333e−28

TABLE 6a SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM.  0 = OB ∞ 31.284792 52.000  1 ∞ 0.000000 65.651  2 193.599182 32.235664 SIO2V 1.56078570 74.583  3 −988.153919 6.121005 74.317  4 95.312730 28.437060 SIO2V 1.56078570 70.720  5 149.958061 29.337945 65.762  6 990.600274 14.692793 SIO2V 1.56078570 60.664  7 −304.549723 0.925424 59.160  8 405.862783 15.231330 SIO2V 1.56078570 54.862  9 −150.695673 27.371286 52.107 10 ∞ 32.082969 43.913 11 −57.761263 34.954745 SIO2V 1.56078570 47.628 12 −73.049428 0.946034 64.468 13 371.078196 22.631363 SIO2V 1.56078570 85.710 14 −1054.171246 2.527973 87.142 15 176.905790 40.262309 SIO2V 1.56078570 93.860 16 −409.710820 29.670881 92.937 17 ∞ 262.083723 87.656 18 −152.961072 −262.083723 REFL 102.730 19 259.893027 262.083723 REFL 180.288 20 ∞ 40.275992 112.284 21 277.112135 28.048210 SIO2V 1.56078570 94.722 22 −1786.674721 65.923060 91.958 23 −115.766876 9.003310 SIO2V 1.56078570 70.538 24 143.904953 28.199458 69.827 25 −500.404643 8.993973 SIO2V 1.56078570 71.476 26 231.435891 40.923491 79.540 27 −194.421161 14.041869 SIO2V 1.56078570 83.835 28 −929.354406 6.572149 102.684 29 1551.636561 74.150055 SIO2V 1.56078570 118.556 30 −151.390217 0.924156 124.858 31 430.573439 62.728287 SIO2V 1.56078570 165.041 32 −668.844997 23.423849 165.694 33 303.567518 38.823785 SIO2V 1.56078570 163.062 34 524.212908 0.932060 160.960 35 176.353964 40.731123 SIO2V 1.56078570 143.422 36 247.491117 0.936510 137.926 37 153.122143 51.077607 SIO2V 1.56078570 124.946 38 412.041144 0.825571 118.371 39 101.547710 45.611823 SIO2V 1.56078570 89.393 40 315.478434 0.825571 80.057 41 58.429322 8.969645 SIO2V 1.56078570 53.083 42 38.144755 40.197998 (F) 1.80000000 37.922 43 ∞ 3.000000 SAPHIR 1.92650829 25.925 44 ∞ 4.345594 (IMMERS.) 1.80000000 21.446 45 = IM ∞ 13.000

TABLE 6b ASPHERIC CONSTANTS SRF 2 6 9 16 18 19 K 0 0 0 0 0 −0.273225 C1 1.958847e−07 1.048404e−07 6.380918e−07 1.042335e−07 1.494444e−08 −4.825071e−10 C2 8.684629e−13 −9.344654e−11  1.135337e−11 −1.647926e−12  6.329335e−13 −6.621967e−15 C3 −1.177298e−15  9.684195e−15 2.969291e−14 −1.770077e−16  1.568829e−17 −6.600515e−20 C4 5.172091e−20 −1.242151e−18  −8.230472e−18  1.938739e−20 1.153993e−21 −4.043335e−24 C5 1.115087e−23 1.848517e−22 3.507973e−21 −8.862178e−25  −3.871456e−26   4.835743e−29 C6 −9.813899e−28  −8.222149e−27  3.205808e−26 1.726247e−29 3.672792e−30 −1.092461e−33 SRF 23 26 29 34 38 40 K 0 0 0 0 0 0 C1 5.116169e−07 3.252068e−07 −2.515552e−08 −1.130904e−08 2.336279e−08 1.464967e−07 C2 −7.631783e−11  −4.649504e−11   1.947845e−13  2.463683e−13 −1.224680e−12  1.974044e−12 C3 1.115383e−14 −2.574578e−15  −1.814191e−17 −1.101814e−17 1.869425e−16 −4.637058e−16  C4 −1.308686e−18  1.022883e−18 −1.328934e−21 −2.972090e−22 −1.001651e−20  1.216769e−19 C5 1.177910e−22 −9.907368e−23   1.639600e−25  1.942591e−26 3.399061e−25 −1.544405e−23  C6 −3.908759e−27  3.745941e−27 −5.808419e−30 −2.321607e−31 −4.264065e−30  7.169909e−28 

1. A system, comprising: a plurality of optical elements arranged along an axis between a first plane and a second plane, the plurality of rigid optical elements comprising a first rigid lens having a concave surface, the first rigid lens being formed from a material having a refractive index n_(L) at a wavelength λ, the system being configured to support a liquid adjacent the concave surface of the first rigid lens between the first rigid lens and the second plane, wherein the system is a microlithography projection objective having a maximum image-side numerical aperture, NA, greater than 1 which during operation is configured to direct radiation at λ from the first plane to the second plane and image an object positioned at the first plane to the second plane when a liquid having a refractive index n_(F) at λ is positioned adjacent the concave surface of the first rigid lens, where n_(F) is greater than n_(L).
 2. The system of claim 1, wherein the concave surface of the first rigid lens is a spherical surface.
 3. The system of claim 2, wherein the spherical surface is positioned a distance that is 80% to 110% of the radius of the spherical surface from the second plane or from another rigid optical element positioned between the first rigid lens and the second plane.
 4. The system of claim 3, wherein the spherical surface is essentially hemispherical.
 5. The system of claim 1, wherein during operation the liquid positioned adjacent the concave surface forms a liquid lens.
 6. The system of claim 5, wherein the liquid lens is a plano-convex liquid lens.
 7. The system of claim 5, wherein the liquid lens is the curved optical element closest to the second plane.
 8. The system of claim 1, wherein the first lens is the closest rigid optical element to the second plane.
 9. The system of claim 1, further comprising a rigid optical element having a planar surface positioned along the axis between the first lens and the second plane.
 10. The system of claim 9, wherein the rigid optical element having the planar surface is a plane-parallel plate.
 11. The system of claim 9, wherein the microlithography projection objective is configured so that during operation a liquid is positioned between the rigid optical element having the planar surface and the second plane.
 12. The system of claim 9, wherein the rigid optical element having a planar surface is formed from sapphire.
 13. The system of claim 9, wherein the rigid optical element having the planar surface has a refractive index n_(EP) at λ, where n_(F)<n_(EP).
 14. The system of claim 9, wherein during operation the liquid positioned adjacent the concave surface of the first lens fills a space along the axis between the first lens and the planar surface.
 15. The system of claim 1, wherein n_(F)>1.4.
 16. The system of claim 1, wherein the first lens is a meniscus lens.
 17. The system of claim 1, wherein the rigid optical element closest to the second plane is formed from a material selected from the group consisting of fused silica, CaF₂, BaF₂, SrF₂, LiF, and NaF.
 18. The system of claim 17, wherein the first rigid lens is the rigid optical element closest to the second plane.
 19. The system of claim 1, wherein the microlithography projection objective is a catadioptric projection objective.
 20. The system of claim 1, wherein the microlithography projection objective forms at least one intermediate image of the object between the first plane and the second plane during operation of the system.
 21. The system of claim 20, wherein the microlithography projection objective forms exactly two intermediate images of the object between the first plane and the second plane during operation of the system.
 22. The system of claim 1, wherein the axis is a straight optical axis.
 23. The system of claim 1, wherein the axis is a folded optical axis.
 24. The system of claim 1, wherein NA is 1.4 or greater.
 25. The system of claim 1, wherein n_(L)<NA<n_(F).
 26. The system of claim 1, wherein all rigid optical elements other than the first rigid optical element in the plurality of rigid optical elements have a refractive index equal to or less than n_(L). 